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Patent Analysis of

Interconnect structure and fabrication method thereof

Updated Time 12 June 2019

Patent Registration Data

Publication Number

US10153231

Application Number

US15/466847

Application Date

22 March 2017

Publication Date

11 December 2018

Current Assignee

UNITED MICROELECTRONICS CORP.

Original Assignee (Applicant)

UNITED MICROELECTRONICS CORP.

International Classification

H01L23/528,H01L21/768,H01L21/285,H01L23/532

Cooperative Classification

H01L23/528,H01L23/53228,H01L21/76871,H01L21/28556,H01L23/5226

Inventor

LIN, KO-WEI,LIN, HUNG-MIAO,LIN, CHUN-LING,CHEN, YING-LIEN,TSAI, HUEI-RU,SU, SHENG-YI

Patent Images

This patent contains figures and images illustrating the invention and its embodiment.

US10153231 Interconnect structure fabrication 1 US10153231 Interconnect structure fabrication 2 US10153231 Interconnect structure fabrication 3
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Abstract

An interconnect structure includes a dielectric layer and a conductor embedded in the dielectric layer. A top surface of the conductor is flush with a top surface of the dielectric layer. A cobalt cap layer is deposited on the top surface of the conductor. A nitrogen-doped cobalt layer is disposed on the cobalt cap layer.

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Claims

1. An interconnect structure, comprising:

a dielectric layer; a conductor embedded in the dielectric layer, wherein a top surface of the conductor is flush with a top surface of the dielectric layer; a cobalt cap layer disposed on the top surface of the conductor; and a nitrogen doped cobalt layer disposed on the cobalt cap layer, wherein the nitrogen doped cobalt layer has a gradient doping profile across a thickness of the nitrogen doped cobalt layer.

2. The interconnect structure according to claim 1, wherein the nitrogen doped cobalt layer has a first nitrogen doping concentration adjacent a top surface of the nitrogen doped cobalt layer and a second nitrogen doping concentration adjacent the cobalt cap layer, wherein the first nitrogen doping concentration is greater than the second nitrogen doping concentration.

3. The interconnect structure according to claim 1, wherein the thickness of the nitrogen doped cobalt layer ranges between 0-50 angstroms.

4. The interconnect structure according to claim 1, wherein the conductor comprises copper.

5. The interconnect structure according to claim 1, wherein the conductor is encased by a barrier layer.

6. The interconnect structure according to claim 5, wherein the barrier layer comprises tantalum or tantalum nitride.

7. The interconnect structure according to claim 1 further comprising an etch stop layer in direct contact with the nitrogen doped cobalt layer.

8. The interconnect structure according to claim 7, wherein the etch stop layer comprises SiCN, SiC, SiON, SiCON, or SiN.

9. The interconnect structure according to claim 1, wherein the dielectric layer comprises low-k dielectric or ultra-low k dielectric.

10. A method of fabricating an interconnect structure, comprising:

providing a substrate having a dielectric layer thereon and a conductor embedded in the dielectric layer, wherein a top surface of the conductor is flush with a top surface of the dielectric layer; depositing a cobalt cap layer on the top surface of the conductor; and performing a surface treatment process to dope nitrogen into the cobalt cap layer thereby forming a nitrogen-doped cobalt layer along a sidewall and a top surface of the cobalt cap layer, wherein the nitrogen doped cobalt layer has a gradient doping profile across a thickness of the nitrogen doped cobalt layer.

11. The method of fabricating an interconnect structure according to claim 10, further comprising:

depositing an etch stop layer on the dielectric layer and the nitrogen-doped cobalt layer.

12. The method of fabricating an interconnect structure according to claim 11, wherein the etch stop layer comprises SiCN, SiC, SiON, SiCON, or SiN.

13. The method of fabricating an interconnect structure according to claim 10, wherein the surface treatment process comprises:

subjecting the cobalt cap layer to a NH3 plasma.

14. The method of fabricating an interconnect structure according to claim 10, wherein the cobalt cap layer is deposited by using a chemical vapor deposition (CVD) process.

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Claim Tree

  • 1
    1. An interconnect structure, comprising:
    • a dielectric layer
    • a conductor embedded in the dielectric layer, wherein a top surface of the conductor is flush with a top surface of the dielectric layer
    • a cobalt cap layer disposed on the top surface of the conductor
    • and a nitrogen doped cobalt layer disposed on the cobalt cap layer, wherein the nitrogen doped cobalt layer has a gradient doping profile across a thickness of the nitrogen doped cobalt layer.
    • 2. The interconnect structure according to claim 1, wherein
      • the nitrogen doped cobalt layer has a first nitrogen doping concentration adjacent a top surface of the nitrogen doped cobalt layer and a second nitrogen doping concentration adjacent the cobalt cap layer, wherein
    • 3. The interconnect structure according to claim 1, wherein
      • the thickness of the nitrogen doped cobalt layer ranges between 0-50 angstroms.
    • 4. The interconnect structure according to claim 1, wherein
      • the conductor comprises
    • 5. The interconnect structure according to claim 1, wherein
      • the conductor is encased by a barrier layer.
    • 7. The interconnect structure according to claim 1 further comprising
      • an etch stop layer in direct contact with the nitrogen doped cobalt layer.
    • 9. The interconnect structure according to claim 1, wherein
      • the dielectric layer comprises
  • 10
    10. A method of fabricating an interconnect structure, comprising:
    • providing a substrate having a dielectric layer thereon and a conductor embedded in the dielectric layer, wherein a top surface of the conductor is flush with a top surface of the dielectric layer
    • depositing a cobalt cap layer on the top surface of the conductor
    • and performing a surface treatment process to dope nitrogen into the cobalt cap layer thereby forming a nitrogen-doped cobalt layer along a sidewall and a top surface of the cobalt cap layer, wherein the nitrogen doped cobalt layer has a gradient doping profile across a thickness of the nitrogen doped cobalt layer.
    • 11. The method of fabricating an interconnect structure according to claim 10, further comprising:
      • depositing an etch stop layer on the dielectric layer and the nitrogen-doped cobalt layer.
    • 13. The method of fabricating an interconnect structure according to claim 10, wherein
      • the surface treatment process comprises:
    • 14. The method of fabricating an interconnect structure according to claim 10, wherein
      • the cobalt cap layer is deposited by using a chemical vapor deposition (CVD) process.
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Description

CROSS REFERENCE TO RELATED APPLICATION

This application claims the priority from CN application No. 201710137691.3, filed Mar. 9, 2017, which is included in its entirety herein by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to the field of semiconductor technology. More particular, the present invention relates to an improved interconnect structure and a method for fabricating the same.

2. Description of the Prior Art

In the semiconductor chips, the interconnect structures formed in the dielectric layer is responsible for the signal transmission. The electronic components formed on the semiconductor substrate, for example, transistors or memory cells, need to be connected to the external circuits via the interconnect structures.

Since copper is a better conductor than aluminum, most of the interconnect structures in semiconductor chips have been fabricated using copper processes, or so-called copper damascene processes. The transition from aluminum to copper required significant developments in fabrication techniques, including radically different methods for patterning the metal as well as the introduction of barrier metal layers to isolate the silicon from potentially damaging copper atoms.

Typically, after completion of the copper damascene process, a cobalt cap layer is typically formed on the copper surface, for example, by sputtering, and then an etch stop layer is deposited. However, although the cobalt cap layer has a good bonding with copper, the bonding property with the etch stop layer is poor, so that there is still a reliability problem.

SUMMARY OF THE INVENTION

It is one object of the present invention to provide an improved interconnect structure and a method for fabricating the same to solve the above-mentioned drawbacks and shortcomings of the prior art.

According to one embodiment, an interconnect structure includes a dielectric layer, a conductor embedded in the dielectric layer, a cobalt cap layer disposed on the top surface of the conductor, and a nitrogen doped cobalt layer disposed on the cobalt cap layer. The top surface of the conductor is flush with the top surface of the dielectric layer. The nitrogen doped cobalt layer has a gradient doping profile across a thickness of the nitrogen doped cobalt layer.

According to another embodiment, an interconnect structure includes a dielectric layer, a conductor embedded in the dielectric layer, a cobalt cap layer disposed on the top surface of the conductor, and a nitrogen doped cobalt layer disposed on the cobalt cap layer. The top surface of the conductor is flush with a top surface of the dielectric layer. The nitrogen doped cobalt layer has a uniform doping profile across a thickness of the nitrogen doped cobalt layer.

According to still another embodiment, a method of fabricating an interconnect structure is disclosed. A substrate having a dielectric layer thereon and a conductor embedded in the dielectric layer is provided. The top surface of the conductor is flush with the top surface of the dielectric layer. A cobalt cap layer is deposited on the top surface of the conductor. A surface treatment process is performed to dope nitrogen into the cobalt cap layer thereby forming a nitrogen-doped cobalt layer.

These and other objectives of the present invention will no doubt become obvious to those of ordinary skill in the art after reading the following detailed description of the preferred embodiment that is illustrated in the various figures and drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 to FIG. 6 are schematic, cross-sectional diagrams showing a method for fabricating an interconnect structure according to one embodiment of the invention.

FIG. 7 shows that the nitrogen-doped cobalt layer has a gradient dopant (nitrogen) concentration distribution in its thickness.

FIG. 8 shows that the nitrogen-doped cobalt layer has a uniform dopant (nitrogen) concentration distribution in its thickness.

DETAILED DESCRIPTION

The present invention has been particularly shown and described with respect to certain embodiments and specific features thereof. The embodiments set forth herein below are to be taken as illustrative rather than limiting. It should be readily apparent to those of ordinary skill in the art that various changes and modifications in form and detail may be made without departing from the spirit and scope of the invention.

Before the further description of the preferred embodiment, the specific terms used throughout the text will be described below.

The term “etch” is used herein to describe the process of patterning a material layer so that at least a portion of the material layer after etching is retained. For example, it is to be understood that the method of etching silicon involves patterning a mask layer (e.g., photoresist or hard mask) over silicon and then removing silicon from the area that is not protected by the mask layer. Thus, during the etching process, the silicon protected by the area of the mask will remain.

In another example, however, the term “etch” may also refer to a method that does not use a mask, but leaves at least a portion of the material layer after the etch process is complete. The above description is used to distinguish between “etching” and “removal”. When “etching” a material layer, at least a portion of the material layer is retained after the end of the treatment. In contrast, when the material layer is “removed”, substantially all the material layer is removed in the process. However, in some embodiments, “removal” is considered to be a broad term and may include etching.

The terms “forming”, “depositing” or the term “disposing” are used hereinafter to describe the behavior of applying a layer of material to the substrate. Such terms are intended to describe any possible layer forming techniques including, but not limited to, thermal growth, sputtering, evaporation, chemical vapor deposition, epitaxial growth, electroplating, and the like.

According to various embodiments, for example, deposition may be carried out in any suitable known manner. For example, deposition may include any growth, plating, or transfer of material onto the substrate. Some known techniques include physical vapor deposition (PVD), chemical vapor deposition (CVD), electrochemical deposition (ECD), molecular beam epitaxy (MBE), atomic layer deposition (ALD), and plasma enhanced CVD (PECVD).

The term “substrate” described in the text is commonly referred to as a silicon substrate. However, the substrate may also be any semiconductor material, such as germanium, gallium arsenide, indium phosphide and the like. In other embodiments, the substrate may be non-conductive, such as glass or sapphire wafers.

FIG. 1 to FIG. 6 are schematic, cross-sectional diagrams showing a method for fabricating an interconnect structure according to one embodiment of the invention.

As shown in FIG. 1, first, a substrate 10 is provided, wherein the substrate 10 may include, but is not limited to, a silicon substrate, a silicon-containing substrate, silicon-on-gallium nitride (or silicon on other materials of the Group III-V), graphene-on-silicon substrate, or a silicon-on-insulator (SOI) substrate. Semiconductor devices such as transistors may be formed on the substrate 10.

According to an embodiment of the present invention, a dielectric layer 12 is formed on the substrate 10. According to an embodiment of the present invention, the dielectric layer 12 may comprise a material having a low dielectric constant (k value less than 5) or a material having an ultra low dielectric constant (k value less than 3). For example, the dielectric layer 12 may comprise silicon dioxide, fluorine-doped silicon dioxide, a porous dielectric layer, and the like.

According to an embodiment of the present invention, a conductor 120 is buried in the dielectric layer 12. The conductor 120 is polished by a chemical mechanical polishing (CMP) process such that a top surface 120a of the conductor 120 is flush with a top surface 12a of the dielectric layer 12. According to an embodiment of the present invention, the conductor 120 comprises copper, for example, a damascened copper wire formed by a copper damascene process.

According to an embodiment of the present invention, the conductor 120 is encased by a barrier layer 121 to avoid diffusion of copper into the dielectric layer 12. According to an embodiment of the present invention, the barrier layer 121 may comprise tantalum or tantalum nitride, but is not limited thereto. Copper damascene processes are well-known art, so the details thereof are omitted.

As shown in FIG. 2, a cobalt cap layer 20 with a thickness of about 50 to 150 angstroms is then selectively deposited on the top surface 120a of the conductor 120. According to an embodiment of the present invention, the cobalt cap layer 20 may be formed using a chemical vapor deposition (CVD) process. The cobalt cap layer 20 is selectively deposited on the top surface 120a of the conductor 120 and is not substantially deposited on the top surface 12a of the dielectric layer 12.

For example, several cobalt-containing precursor adsorption (also referred to as D) steps incorporated with several hydrogen reduction (also referred to as T) steps may be carried out using a cobalt CVD reactor (e.g., a cobalt CVD tool manufactured by Applied Materials, Inc.) until the top surface 120a of the conductor 120 is completely covered with a cobalt layer. For example, the thickness of the desired cobalt cap layer 20 may be deposited using a 3D3T cycle or a 3D2T cycle.

The above-described 3D3T cycle refers to three cobalt-containing precursor adsorption steps in combination with three hydrogen reduction steps, wherein each cobalt-containing precursor adsorption step is followed by a hydrogen-containing reduction step.

The above-described 3D2T cycle refers to three cobalt-containing precursor adsorption steps in combination with two hydrogen reduction steps, wherein each cobalt-containing precursor adsorption step is followed by a hydrogen-containing reduction step. The reaction ceases after the third cobalt-containing precursor adsorption step is completed and no hydrogen reduction step is carried out after the third cobalt-containing precursor adsorption step.

According to an embodiment of the present invention, the above-mentioned cobalt-containing precursor adsorption step may use an organometallic substance such as CoCOCp (chemical formula: C2H5Co (CO)2) as a cobalt precursor, and the flow rate thereof may be in the range of 10 to 50 sccm. The hydrogen reduction step described above may be carried out at a flow rate of 1000 to 8000 sccm. During the reaction, the pressure in the reactor can be controlled at 5 to 40 torr and the temperature can be controlled at 150 to 300° C.

As shown in FIG. 3, after completion of the deposition process of the cobalt cap layer 20, a surface treatment process 30 is performed by implanting nitrogen into the cobalt cap layer 20, thereby forming a nitrogen-doped cobalt layer 210. According to an embodiment of the present invention, the thickness of the nitrogen-doped cobalt layer 210 may be in the range of 0 to 50 angstroms.

According to an embodiment of the present invention, the method of implanting the nitrogen into the cobalt cap layer 20 involves direct contact of the cobalt cap layer 20 with an ammonia gas plasma. The above-mentioned ammonia gas plasma may be generated by a remote plasma source and then introduced into a CVD reactor, but is not limited thereto. According to an embodiment of the present invention, a power of 0 to 1000 watt can be appropriately provided in the CVD reactor during the surface treatment process 30, but is not limited thereto.

As shown in FIG. 4, an etch stop layer 40 is conformally deposited on the dielectric layer 12 and the nitrogen-doped cobalt layer 210. According to an embodiment of the present invention, the etch stop layer 40 may comprise SiCN, SiC, SiON, SiCON, or SiN, but is not limited thereto. Since the nitrogen-doped cobalt layer 210 has an excellent bonding property with the etch stop layer 40, a tightly bonding interface can be formed, so that the reliability of the interconnect structure can be improved.

Subsequently, a dielectric layer 42 is deposited on the etch stop layer 40. According to an embodiment of the present invention, the dielectric layer 42 may comprise a material having a low dielectric constant (k value less than 5) or a material having an ultra low dielectric constant (k value less than 3). For example, the dielectric layer 42 may comprise silicon dioxide, fluorine-doped silicon dioxide, a porous dielectric layer, and the like.

As shown in FIG. 5 and FIG. 6, a copper damascene process is performed. For example, a trench structure 410 is formed in the dielectric layer 42 and the etch stop layer 40, including a wire trench 411 and a via hole 412. The via hole 412 may penetrate the nitrogen-doped cobalt layer 210 and the cobalt cap layer 20 to partially expose the top surface 120a of the conductor 120.

Next, a barrier layer 421, such as tantalum or tantalum nitride, is conformally deposited on the surface of the trench structure 410, but is not limited thereto. Then, a copper seed layer (not shown) may be deposited, and a copper wire structure 420 may be formed in the trench structure 410 by electroplating. The copper wire structure 420 may be electrically connected to the underlying conductor 120 via an integrally formed copper via 422.

According to an embodiment of the present invention, the nitrogen-doped cobalt layer 210 has a gradient dopant (nitrogen) concentration distribution across its thickness, as shown in FIG. 7. According to an embodiment of the present invention, the nitrogen-doped cobalt layer 210 has a first nitrogen doping concentration P1 at a shallower depth, for example, the depth d1 in FIG. 7, which is closer to the top surface of the nitrogen-doped cobalt layer 210. The nitrogen-doped cobalt layer 210 has a second nitrogen doping concentration P2 at a deeper depth, for example, the depth d2 in FIG. 7, which is adjacent to the cobalt cap layer 20. The first nitrogen doping concentration P1 is greater than the second nitrogen doping concentration P2. For example, the depth d1 may be between 0 and 10 angstroms, and the first nitrogen doping concentration P1 may be between 20 and 30 atomic percent.

According to another embodiment of the present invention, the nitrogen-doped cobalt layer 210 has a uniform dopant (nitrogen) concentration distribution across its thickness, as shown in FIG. 8. According to an embodiment of the present invention, the nitrogen-doped cobalt layer 210 has a first nitrogen doping concentration P1 at a shallower depth, for example, the depth d1 in FIG. 8, which is closer to the top surface of the nitrogen-doped cobalt layer 210. The nitrogen-doped cobalt layer 210 has a second nitrogen doping concentration P2 at a deeper depth, for example the depth d2 in FIG. 8, which is adjacent the cobalt cap layer 20. The first nitrogen doping concentration P1 is approximately equal to the second nitrogen doping concentration P2 between the depth d1 and the depth d2. In FIG. 8, the nitrogen doping concentration between depth d1 and depth d2 is approximately fixed (approximately a constant value).

Those skilled in the art will readily observe that numerous modifications and alterations of the device and method may be made while retaining the teachings of the invention. Accordingly, the above disclosure should be construed as limited only by the metes and bounds of the appended claims.

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Citation

Patents Cited in This Cited by
Title Current Assignee Application Date Publication Date
Methods for thermally forming a selective cobalt layer APPLIED MATERIALS, INC. 03 November 2015 12 May 2016
Method of making an interconnect device LAM RESEARCH CORPORATION 04 October 2013 02 August 2016
Treating copper interconnects INTERNATIONAL BUSINESS MACHINES CORPORATION 04 April 2016 29 August 2017
Interconnect structures containing nitrided metallic residues INTERNATIONAL BUSINESS MACHINES CORPORATION 16 September 2013 13 November 2014
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US10153231 Interconnect structure fabrication 1 US10153231 Interconnect structure fabrication 2 US10153231 Interconnect structure fabrication 3